SOI Applications

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Updated: April 30, 2012

SOI Fundamentals

Process Technology

SOI Scalability
[by Harry Gries, ASIC Methodology and EDA Technology Consultant]

Hot carrier injection from nanometer-thick silicon-on-insulator films measured by optical second-harmonic generation
[Applied Physics Letters, Vol. 96, Issue 24]

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Fully Depleted SOI

Design/IP

NEW Leti: Adding Strain to FD-SOI for 20nm and Beyond
[Advanced Substrate News]

Interview With ST-Ericsson's Chief Chip Architect: SOCs on 28nm FD-SOI – When, Why and How
ST-Ericsson's Chief Chip Architect Louis Tannyeres talks with ASN about the move to 28nm FD-SOI for smartphones and tablet SOCs. [Advanced Substrate News]

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Analog/HV/RF

Photonics

Ultra-high Speed, All-optical Wavelength Converters Using Single SOA and SOI Photonic Integrated Circuits
We report a new family of ultra-fast all-optical wavelength converters. The device architecture employs a single SOA and filtering elements integrated in silicon-on-insulator substrates. These schemes enable high-integration density and low power consumption. [Department of Information Technology (INTEC), Ghent University]

Device engineering for silicon photonics
[NPG Asia Materials]

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Power

NEW Leti: Adding Strain to FD-SOI for 20nm and Beyond
[Advanced Substrate News]

Interview With ST-Ericsson's Chief Chip Architect: SOCs on 28nm FD-SOI – When, Why and How
ST-Ericsson's Chief Chip Architect Louis Tannyeres talks with ASN about the move to 28nm FD-SOI for smartphones and tablet SOCs. [Advanced Substrate News]

> More articles

Sensors/MEMS

SiTime: Using SOI Technology to Develop High-Performance MEMS Timing Solutions
A radical SOI-based approach puts SiTime at the top of the fast-growing silicon-based timing market. [Advanced Substrate News ]

How an SOI MEMS are built : MEMS first™ process
[SiTime]

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3D integration

Wireless Interconnects for Inter-tier Communication on 3D ICs
By Ankit More and Baris Taskin [Department of Electrical and Computer Engineering, Drexel University 3141 Chestnut Street, Philadelphia, Pennsylvania 19104, USA]

Fraunhofer IZM-ASSID selects EV Group Temporary Bonding and Debonding Equipment for Devoloping Processes for High-Volume Manufacturing of 3D ICS
EVG Systems Selected for Platform Flexibility, Functionality and Industry-Proven Reliability [EV Group (EVG)]

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Advanced Substrate News

Last post on May 02, 2012:

Consortium Website – What’s New

> Read this post

#19 – Spring/Summer 2012
Special Edition: FD-SOI Industrialization

  • Technology: ST/Soitec white paper excerpts
  • Apps – ST-Ericsson's NovaThor at 28nm (interview)
  • 20nm & Beyond: Chenming Hu; Leti
  • Wafers: Soitec's Roadmap
  • SOI Consortium – benchmarking

> Read the full edition

Press releases

The SOI Industry Consortium launches SOI Implementation Guide


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BOSTON, MASS., September 16, 2008 – The SOI Industry Consortium, focused on accelerating silicon-on-insulator (SOI) innovation into broad markets, announced today the availability of the first chapters of its SOI Implementation Guide. The SOI Implementation Guide features a series of white papers and presentations from industry experts on specific topics to promote a common understanding of the value and challenges of SOI. “Education is key to reducing barriers to adoption. Having easily accessible information is essential to providing the knowledge and expertise needed to inform the industry and eliminating present misconceptions,” said Horacio Mendez, executive director of the SOI Industry Consortium. “ The ongoing creation of chapters for the SOI Implementation Guide represents great teamwork and individual contributions from the companies and academic and R&D organizations within our consortium.” SOI process technologies have been used to implement high-performance, cutting-edge, custom designs, such as microprocessors, for several process generations. The benefits of SOI demonstrated by these designs – higher performance with the same power consumption, or lower power consumption with the same performance – have made SOI an attractive alternative for more mainstream designs as well. The SOI Implementation Guide features subjects such as a methodology for comparing bulk and SOI process technologies for design teams investigating the potential benefits of SOI. Another chapter addresses the partially depleted SOI circuit design advantages such as improved chip performance and lower power consumption, as well as the design issues raised by the bulk CMOS circuit design community. Other upcoming chapters will cover subjects such as an SOI overview and assessment for Analog and Mixed Signal (including 6 individual chapters on the application of SOI to RF and Analog), SOI cost analysis, FinFets and SOI, SRAM scalability in bulk and SOI, followed by a guide on how to port IP from bulk to SOI. The SOI Industry Consortium is open to any company, organization or academic institution with an interest in SOI. Certain chapters of the Implementation Guide will initially be available to members only; the rest will be available to the general public on the consortium’s website: www.soiconsortium.org About the SOI Industry Consortium: The SOI Industry Consortium is chartered with accelerating silicon-on-insulator (SOI) innovation into broad markets by promoting the benefits of SOI technology and reducing the barriers to adoption. Representing leaders spanning the entire electronics industry infrastructure, SOI Industry Consortium members include: AMD, Applied Materials, ARM, Cadence Design Systems, CEA-Léti, Chartered Semiconductor Manufacturing, Freescale Semiconductor, IBM, Innovative Silicon, KLA-Tencor, Lam Research, Magma Design, Nvidia, Samsung, Semico, Soitec, SEH Europe, STMicroelectronics, Symmid Semiconductor, Synopsys, TSMC, Tyndall Institute, UCL (Université Catholique de Louvain) and UMC. Membership is open to all companies and institutions throughout the electronics industry. Legal Note: The views and opinions expressed by the SOI Industry Consortium through officers in the SOI Industry Consortium or in this presentation or other communication vehicles are not necessarily representative of the views and opinions of individual members. Officers of the SOI Industry Consortium speaking on behalf of the Consortium should not be considered to be speaking for the member company or companies they are associated with, but rather as representing the views of the SOI Industry Consortium. Views and opinions are also subject to change without notice, and the SOI Industry Consortium assumes no obligation to update the information in this communication or accompanying discussions. Press Contact: Camille Darnaud-Dufour +33 (0) 6 79 49 51 43 camille.darnaud-dufour@soiconsortium.org


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